SEM at the Edge
Since 2003 the equipment available at the MAU has grown to include the LEO high resolution scanning electron microscope.
 The MAU continues to be a popular posting for European exchange students
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This instrument offers spatial resolution that rivals that of an atomic force microscope, with the unique functionalities of electron back-scatter diffraction and analysis of chemical composition that only an electron beam instrument has. MAU staff continue to delight and surprise the user community with stunning high resolution images and new analytical capabilities such as sub-50 nm chemical phase imaging and crystal orientation mapping. The microscope can also be used to prototype novel nanoscale devices using the newly acquired Raith Elphy high speed lithography system and a planned integrated gas injector unit which delivers pre-cursor chemicals for enhanced electron beam induced etching or deposition. Using this system, three-dimensional nano-structures containing both conductive and insulating materials will be fabricated the existing state-of-the-art 1 nm resolution high-current variable-pressure electron microscope provides a very special capability. This combination of instrumentation will be used to manufacture prototypes of novel nanoscale devices and structures. The participants in this activity include A/Prof. Matthew Phillips, Dr Richard ('Rick') Wuhrer, and Ms K McBean.
